Wednesday, February 15, 2012

1202.3016 (T. Maassen et al.)

Long spin relaxation times in wafer scale epitaxial graphene on
SiC(0001)
   [PDF]

T. Maassen, J. J. van den Berg, N. IJbema, F. Fromm, T. Seyller, R. Yakimova, B. J. van Wees
We developed an easy, upscalable process to prepare lateral spin-valve
devices on epitaxially grown monolayer graphene on SiC(0001) and perform
nonlocal spin transport measurements. We observe the longest spin relaxation
times tau_S in monolayer graphene, while the spin diffusion coefficient D_S is
strongly reduced compared to typical results on exfoliated graphene. The
increase of tau_S is probably related to the changed substrate, while the cause
for the small value of D_S remains an open question.
View original: http://arxiv.org/abs/1202.3016

No comments:

Post a Comment