1205.0909 (J. C. Mahato et al.)

Nanodot to Nanowire: A strain-driven shape transition in self-organized
endotaxial CoSi2 on Si (100)    [PDF]

J. C. Mahato, Debolina Das, R. R. Juluri, R. Batabyal, Anupam Roy, P. V. Satyam, B. N. Dev

We report a phenomenon of strain-driven shape transition in the growth of nanoscale self-organized endotaxial CoSi2 islands on Si (100) substrates. Small square shaped islands as small as 15\times15 nm2 have been observed. Islands grow in the square shape following the four fold symmetry of the Si (100) substrate, up to a critical size of 67 \times 67 nm2. A shape transition takes place at this critical size. Larger islands adopt a rectangular shape with ever increasing length and the width decreasing to an asymptotic value of ~25 nm. This produces long wires of nearly constant width.We have observed nanowire islands with aspect ratios as large as ~ 20:1. The long nanowire heterostructures grow partly above (~ 3 nm) the surface, but mostly into (~17 nm) the Si substrate. These self-organized nanostructures behave as nanoscale Schottky diodes. They may be useful in Si-nanofabrication and find potential application in constructing nano devices.

View original: http://arxiv.org/abs/1205.0909