Friday, March 22, 2013

1303.5133 (Xin Ou et al.)

Reverse epitaxy of Ge: ordered and facetted surface patterns    [PDF]

Xin Ou, Adrian Keller, Manfred Helm, Jürgen Fassbender, Stefan Facsko
Normal incidence ion irradiation at elevated temperatures, when amorphization is prevented, induces novel nanoscale patterns of crystalline structures on elemental semiconductors by a reverse epitaxial growth mechanism: on Ge surfaces irradiation at temperatures above the recrystallization temperature of 250{\deg}C leads to self-organized patterns of inverse pyramids. Checkerboard patterns with fourfold symmetry evolve on the Ge (100) surface, whereas on the Ge (111) surface, isotropic patterns with a sixfold symmetry emerge. After high fluence irradiations these patterns exhibit well developed facets. A deterministic nonlinear continuum equation accounting for the effective surface currents due to an Ehrlich-Schwoebel barrier for diffusing vacancies reproduces remarkably well our experimental observations.
View original: http://arxiv.org/abs/1303.5133

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