1304.3631 (M. Gschrey et al.)

In-situ electron-beam lithography of deterministic single-quantum-dot
mesa-structures using low-temperature cathodoluminescence spectroscopy    [PDF]

M. Gschrey, F. Gericke, A. Schüßler, R. Schmidt, J. -H. Schulze, T. Heindel, S. Rodt, A. Strittmatter, S. Reitzenstein

We report on the deterministic fabrication of sub-um mesa structures containing single quantum dots by in-situ electron-beam lithography. The fabrication method is based on a two-step lithography process using a low-temperature cathodoluminescence (CL) spectroscopy setup. In the first step the position and spectral features of single InGaAs quantum dots (QDs) are detected by CL. Then circular sub-um mesa-structures are exactly defined by high-resolution electron-beam lithography and subsequent etching in the second step. CL spectroscopy and micro-photoluminscence spectroscopy demonstrate the high optical quality of the single-QD mesa-structures with emission linewidths below 15 ueV and g(2)(0) = 0.04. Our lithography method allows for an alignment precision better than 100 nm which paves the way for a fully-deterministic device technology using in-situ CL lithography.

View original: http://arxiv.org/abs/1304.3631