Wednesday, June 19, 2013

1306.4234 (Kyoichi Suzuki et al.)

Edge Channel Transport in InAs/GaSb Topological Insulating Phase    [PDF]

Kyoichi Suzuki, Yuichi Harada, Koji Onomitsu, Koji Muraki
Transport in InAs/GaSb heterostructures with different InAs layer thicknesses is studied using a six-terminal Hall bar geometry with a 2-$\mu$m edge channel length. For a sample with a 12-nm-thick InAs layer, non-local resistance measurements with various current/voltage contact con?gurations reveal that the transport is dominated by edge channels with negligible bulk contribution. Systematic non-local measurements allow us to extract the resistance of individual edge channels, revealing sharp resistance uctuations indicative of inelastic scattering. Our results show that the InAs/GaSb system can be tailored to have conducting edge channels while keeping a gap in the bulk region and provide a way of studying 2D topological insulators even when quantized transport is absent.
View original: http://arxiv.org/abs/1306.4234

No comments:

Post a Comment